| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables production of a resist pattern having superior CD uniformity and reduced defects. <P>SOLUTION: A resist composition contains a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and an acid generator having a structure to be cleaved by the action of an alkali developer, where A<SP POS="POST">13</SP>represents a bivalent aliphatic hydrocarbon group that may have a halogen atom. <P>COPYRIGHT: (C)2013,JPO&INPIT |
