发明名称 Method and Apparatus for Doping by Lane in a Multi-Lane Sheet Wafer Furnace
摘要 A method and apparatus for forming a sheet wafer add material to a crucible having a feed area and a dump area, and melt the material to form a wafer growth area between the feed area and the dump area. The material is added to the feed area and removed through the dump area. The method and apparatus substantially simultaneously draw a plurality of sheet wafers from the growth area, and directly apply dopant to the melted material at the growth area. The dopant thus bypasses the feed area to dope at least a portion of the growth area.
申请公布号 US2013047913(A1) 申请公布日期 2013.02.28
申请号 US201113220025 申请日期 2011.08.29
申请人 KERNAN BRIAN;MAX ERA, INC. 发明人 KERNAN BRIAN
分类号 C30B15/20;C30B15/04 主分类号 C30B15/20
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