发明名称 METHODS FOR OPTIMIZING A PLASMA PROCESS
摘要 Methods for optimizing a plasma process are provided. The method may include obtaining a measurement spectrum from a plasma reaction in a chamber, calculating a normalized measurement standard and a normalized measurement spectrum of the measurement spectrum, comparing the normalized measurement spectrum with a normalized reference spectrum, and comparing the normalized measurement standard with a normalized reference standard to determine whether to change a process parameter of the plasma process or clean the chamber when the normalized measurement spectrum and the normalized reference spectrum are mismatched.
申请公布号 US2013052757(A1) 申请公布日期 2013.02.28
申请号 US201213599155 申请日期 2012.08.30
申请人 PARK SANGWUK;BAEK KYE HYUN;SHIN KYOUNGSUB;LEE BRAD H.;SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK SANGWUK;BAEK KYE HYUN;SHIN KYOUNGSUB;LEE BRAD H.
分类号 H01L21/66;B08B7/00;H01L21/205;H01L21/3065 主分类号 H01L21/66
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