发明名称 |
METHODS FOR OPTIMIZING A PLASMA PROCESS |
摘要 |
Methods for optimizing a plasma process are provided. The method may include obtaining a measurement spectrum from a plasma reaction in a chamber, calculating a normalized measurement standard and a normalized measurement spectrum of the measurement spectrum, comparing the normalized measurement spectrum with a normalized reference spectrum, and comparing the normalized measurement standard with a normalized reference standard to determine whether to change a process parameter of the plasma process or clean the chamber when the normalized measurement spectrum and the normalized reference spectrum are mismatched.
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申请公布号 |
US2013052757(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201213599155 |
申请日期 |
2012.08.30 |
申请人 |
PARK SANGWUK;BAEK KYE HYUN;SHIN KYOUNGSUB;LEE BRAD H.;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK SANGWUK;BAEK KYE HYUN;SHIN KYOUNGSUB;LEE BRAD H. |
分类号 |
H01L21/66;B08B7/00;H01L21/205;H01L21/3065 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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