发明名称 |
PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME |
摘要 |
A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern. |
申请公布号 |
US2013048604(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201213568233 |
申请日期 |
2012.08.07 |
申请人 |
KANG MIN;JU JIN-HO;LEE JONG-KWANG;KIM BONG-YEON;KIM JEONG-WON;KANG DEOK-MAN;CHO JUNG-HWAN;CHOI KYUNG-MI |
发明人 |
KANG MIN;JU JIN-HO;LEE JONG-KWANG;KIM BONG-YEON;KIM JEONG-WON;KANG DEOK-MAN;CHO JUNG-HWAN;CHOI KYUNG-MI |
分类号 |
G03F7/004;B44C1/22;G03F7/016;G03F7/022;G03F7/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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