发明名称 |
REDUCED CONSUMPTION STAND ALONE RINSE TOOL HAVING SELF-CONTAINED CLOSED-LOOP FLUID CIRCUIT, AND METHOD OF RINSING SUBSTRATES USING THE SAME |
摘要 |
<p>A system and method of for rinsing substrates that reduces or substantially eliminates rinse fluid consumption. In one embodiment, the method comprises: a) providing a fixed volume of a rinse fluid in a stand-alone rinse tool comprising a closed-loop fluid-circuit comprising a rinse tank, a deionizer, a pump, and a recirculation line fluidly coupled to an outlet of the rinse tank and an inlet of the rinse tank; and b) performing a plurality of rinse cycles in the stand-alone rinse tool using the fixed volume of the rinse fluid, wherein each of the plurality of rinse cycles comprises: b-1) positioning a batch of substrates comprising ionic impurities in the rinse tank.</p> |
申请公布号 |
WO2013028641(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
WO2012US51630 |
申请日期 |
2012.08.20 |
申请人 |
AKRION SYSTEMS LLC;KASHKOUSH, ISMAIL;NEMETH, DENNIS;CHEN, GIM-SYANG |
发明人 |
KASHKOUSH, ISMAIL;NEMETH, DENNIS;CHEN, GIM-SYANG |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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