发明名称 REDUCED CONSUMPTION STAND ALONE RINSE TOOL HAVING SELF-CONTAINED CLOSED-LOOP FLUID CIRCUIT, AND METHOD OF RINSING SUBSTRATES USING THE SAME
摘要 <p>A system and method of for rinsing substrates that reduces or substantially eliminates rinse fluid consumption. In one embodiment, the method comprises: a) providing a fixed volume of a rinse fluid in a stand-alone rinse tool comprising a closed-loop fluid-circuit comprising a rinse tank, a deionizer, a pump, and a recirculation line fluidly coupled to an outlet of the rinse tank and an inlet of the rinse tank; and b) performing a plurality of rinse cycles in the stand-alone rinse tool using the fixed volume of the rinse fluid, wherein each of the plurality of rinse cycles comprises: b-1) positioning a batch of substrates comprising ionic impurities in the rinse tank.</p>
申请公布号 WO2013028641(A1) 申请公布日期 2013.02.28
申请号 WO2012US51630 申请日期 2012.08.20
申请人 AKRION SYSTEMS LLC;KASHKOUSH, ISMAIL;NEMETH, DENNIS;CHEN, GIM-SYANG 发明人 KASHKOUSH, ISMAIL;NEMETH, DENNIS;CHEN, GIM-SYANG
分类号 H01L21/00 主分类号 H01L21/00
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