| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high resolution and giving a good pattern shape, and a pattern forming method using the positive resist composition in immersion lithography that is carried out by forming a protective film. <P>SOLUTION: The positive resist composition comprises: (A) a resin having a methacrylic repeating unit including an adamantyl at a tertiary carbon as an acid labile group and a methacrylic repeating unit having a cyclic structure formed by a tertiary carbon, the alkali solubility of which is enhanced by an acid; (B) a photoacid generator; (C) a compound expressed by the general formula (3); and (D) a solvent. <P>COPYRIGHT: (C)2013,JPO&INPIT |
