| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having more preferable line edge roughness (LER) can be produced. <P>SOLUTION: The resist composition comprises: a resin (A) having an acid decomposable group; a salt (B) expressed by the formula (B4) and a salt (E1) expressed by the formula (E1). In formula (B4), A<SP POS="POST">+</SP>represents an organic cation having neither acid decomposable group nor nitrogen atom, and X<SB POS="POST">a</SB><SP POS="POST">-</SP>represents an organic sulfonic acid anion having an acid decomposable group and no nitrogen atom. In formula (E1), A<SB POS="POST">N</SB>represents an organic cation having a nitrogen atom, and X<SP POS="POST">-</SP>represents an organic sulfonic acid anion having no nitrogen atom. <P>COPYRIGHT: (C)2013,JPO&INPIT |
