发明名称 |
CARBON CONTAINING LOW-K DIELECTRIC CONSTANT RECOVERY USING UV TREATMENT |
摘要 |
A method for the ultraviolet (UV) treatment of carbon-containing low-k dielectric and associated apparatus enables process induced damage repair. The methods of the invention are particularly applicable in the context of damascene processing to recover lost low-k property of a dielectric damaged during processing, either pre-metallization, post-planarization, or both. UV treatments can include an exposure of the subject low-k dielectric to a constrained UV spectral profile and/or chemical silylating agent, or both. |
申请公布号 |
WO2012087620(A3) |
申请公布日期 |
2013.02.28 |
申请号 |
WO2011US64246 |
申请日期 |
2011.12.09 |
申请人 |
NOVELLUS SYSTEMS, INC.;VARADARAJAN, BHADRI N.;MCLAUGHLIN, KEVIN M.;VAN SCHRAVENDIJK, BART |
发明人 |
VARADARAJAN, BHADRI N.;MCLAUGHLIN, KEVIN M.;VAN SCHRAVENDIJK, BART |
分类号 |
H01L21/31;H01L21/26;H01L21/324 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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