GAS TREATMENT METHOD, GAS TREATMENT APPARATUS, METHOD OF FORMING FINE POWDER, AND FINE POWDER FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To remove a hydride of silicon from gas containing the hydride of silicon in a simpler manner than conventional ones while suppressing increase in costs.

SOLUTION: A gas treatment method removes the hydride of silicon from gas containing the hydride of silicon. The gas treatment method is adopted, which is characterized in that bubbles having a diameter of 10 μm or less and comprising the gas containing the hydride of silicon are brought into contact with water.

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