| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for efficiently producing a patterned body by which high-definition patterning can be performed by using vacuum ultraviolet light, and a resist mask used for the method. <P>SOLUTION: The resist mask comprises a substrate, a transmissive part formed on the substrate and transmitting vacuum ultraviolet light, and a resist pattern formed on the transmissive part and having a lower transmittance for vacuum ultraviolet light than that of the transmissive part. The transmissive part is formed into a size equal to or larger than the size of the resist pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
