| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for preventing a particle from adhering to an original plate. <P>SOLUTION: A lithographic device for transferring a pattern to a substrate using an original plate having a pattern region in which the pattern is formed comprises: a stocker which stores the original plate; a processing unit which performs transfer processing to transfer the pattern to the substrate; and a transportation mechanism which transports the original plate between the stocker and the processing unit. The transportation mechanism includes a protection plate which protects the pattern region by being arranged so as to cover the pattern region and a holding unit which is arranged in the protection plate and holds the original plate via a portion other than the pattern region of the original plate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
