发明名称 |
ANALYZING EM PERFORMANCE DURING IC MANUFACTURING |
摘要 |
A testing structure, system and method for monitoring electro-migration (EM) performance. A system is described that includes an array of testing structures, wherein each testing structure includes: an EM resistor having four point resistive measurement, wherein a first and second terminals provide current input and a third and fourth terminals provide a voltage measurement; a first transistor coupled to a first terminal of the EM resistor for supplying a test current; the voltage measurement obtained from a pair of switching transistors whose gates are controlled by a selection switch and whose drains are utilized to provide a voltage measurement across the third and fourth terminals. Also included is a decoder for selectively activating the selection switch for one of the array of testing structures; and a pair of outputs for outputting the voltage measurement of a selected testing structure.
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申请公布号 |
US2013049793(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201113222306 |
申请日期 |
2011.08.31 |
申请人 |
CHEN FEN;DUFRESNE ROGER A.;FENG KAI D.;ST-PIERRE RICHARD J.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHEN FEN;DUFRESNE ROGER A.;FENG KAI D.;ST-PIERRE RICHARD J. |
分类号 |
G01R31/26;G01R31/02 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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