GROUP III NITRIDE SEMICONDUCTOR LASER DEVICE

摘要

A group-III nitride semiconductor laser device includes an n-type nitride semiconductor region, an active layer provided over the n-type nitride semiconductor region, a first p-type nitride semiconductor region provided over the active layer, a current confinement layer which is provided over the first p-type nitride semiconductor region and has an opening extending in a optical cavity direction, and a second p-type nitride semiconductor region re-grown on the first nitride semiconductor region and the current confinement layer after the formation of the opening of the current confinement layer. The interface between the first p-type nitride semiconductor region and the second p-type nitride semiconductor region includes a semi-polar plane. At least one of the first or second p-type semiconductor regions includes a highly doped p-type semiconductor layer forming an interface with the first and second p-type semiconductor regions and have a p-type impurity level of 1×1020 cm−3 or greater.