发明名称 WIRING STRUCTURE AND MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 A wiring structure includes: an insulating film formed over a substrate; a plurality of wirings formed on the insulating film; and an inducing layer, which is formed on the insulating film in a region between the plurality of wirings, a constituent atoms of the wirings are diffused in the inducing layer.
申请公布号 US2013048358(A1) 申请公布日期 2013.02.28
申请号 US201213530815 申请日期 2012.06.22
申请人 KANKI TSUYOSHI;SUDA SHOICHI;NAKATA YOSHIHIRO;FUJITSU LIMITED 发明人 KANKI TSUYOSHI;SUDA SHOICHI;NAKATA YOSHIHIRO
分类号 H05K1/00;H05K1/02;H05K3/00 主分类号 H05K1/00
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