| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce a collapse or omission failure caused by fining of resist patterns. <P>SOLUTION: A pattern generation device 11 includes a light intensity calculation unit 11a for calculating light intensity of a pattern formed based on exposure and an area around the pattern, a light intensity evaluation unit 11b for evaluating light intensity of the pattern and an area around the pattern, and a data output unit 11c for outputting correction data on the pattern on the basis of evaluation results of the light intensity evaluation unit 11b. <P>COPYRIGHT: (C)2013,JPO&INPIT |
