| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a spacer having high exposure sensitivity to g-line and h-line and showing excellent profiles in both of a main PS (photospacer) and a sub PS. <P>SOLUTION: A photosensitive resin composition is provided, comprising (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer, and (D) an alkali-soluble resin. The (A) photopolymerization initiator comprises one or more O-acyloxime ester compounds and one or more α-aminoacetophenone compounds. With the photosensitive resin composition, two or more independent patterns can be simultaneously formed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
