发明名称 |
Metrology Method and Apparatus, and Device Manufacturing Method |
摘要 |
A target structure including a periodic structure is formed on a substrate. An image of the target structure is detected while illuminating the target structure with a beam of radiation, the image being formed using a first part of non-zero order diffracted radiation while excluding zero order diffracted radiation. Intensity values extracted from a region of interest within the image are used to determine a property of the periodic structure. A processing unit recognizes locations of a plurality of boundary features in the image of the target structure to identify regions of interest. The number of boundary features in each direction is at least twice a number of boundaries of periodic structures within the target structure. The accuracy of locating the region is greater than by recognizing only the boundaries of the periodic structure(s).
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申请公布号 |
US2013050501(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201213542319 |
申请日期 |
2012.07.05 |
申请人 |
WARNAAR PATRICK;VAN SCHIJNDEL MARK;KUBIS MICHAEL;ASML NETHERLANDS B.V. |
发明人 |
WARNAAR PATRICK;VAN SCHIJNDEL MARK;KUBIS MICHAEL |
分类号 |
G06K9/46;G03B27/32;G06K9/00;H04N5/225 |
主分类号 |
G06K9/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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