发明名称 SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE
摘要 A semiconductor device including a semiconductor substrate and a conductive post overlying and electrically connected to the substrate. The semiconductor device further includes a manganese-containing protection layer on a surface of the conductive post. A method of forming a semiconductor device. The method includes forming a bond pad region on a semiconductor substrate. The method further includes forming a conductive post overlying and electrically connected to the bond pad region. The method further includes forming a protection layer on a surface of the conductive post, wherein the protection layer comprises manganese (Mn).
申请公布号 US2013049194(A1) 申请公布日期 2013.02.28
申请号 US201213660348 申请日期 2012.10.25
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIU CHUNG-SHI;YU CHEN-HUA
分类号 H01L23/498;H01L21/768 主分类号 H01L23/498
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