发明名称 DIE-CUT THROUGH-GLASS VIA AND METHODS FOR FORMING SAME
摘要 This disclosure provides systems, methods and apparatus for providing electrical connections through glass substrates. In one aspect, a through-glass via including a peripheral through-glass via hole and sidewall metallization is provided. Sidewall metallization can include multiple conductive lines facilitating increased interconnect density. In another aspect, one or more methods of forming peripheral through-glass vias are provided. In some implementations, the methods include double-sided processes to form aligned via holes in a glass substrate that together form a through-glass via hole, followed by sidewall metallization and dicing through the through-glass via hole.
申请公布号 US2013050226(A1) 申请公布日期 2013.02.28
申请号 US201113221677 申请日期 2011.08.30
申请人 SHENOY RAVINDRA VAMAN;BURNS DAVID WILLIAM;PETERSEN KURT EDWARD;QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 SHENOY RAVINDRA VAMAN;BURNS DAVID WILLIAM;PETERSEN KURT EDWARD
分类号 G06T1/00;B05D3/10;B05D3/12;B05D5/12;B32B37/14;B32B38/10;C23F1/00;H05K1/00;H05K7/00 主分类号 G06T1/00
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