发明名称 |
DIE-CUT THROUGH-GLASS VIA AND METHODS FOR FORMING SAME |
摘要 |
This disclosure provides systems, methods and apparatus for providing electrical connections through glass substrates. In one aspect, a through-glass via including a peripheral through-glass via hole and sidewall metallization is provided. Sidewall metallization can include multiple conductive lines facilitating increased interconnect density. In another aspect, one or more methods of forming peripheral through-glass vias are provided. In some implementations, the methods include double-sided processes to form aligned via holes in a glass substrate that together form a through-glass via hole, followed by sidewall metallization and dicing through the through-glass via hole. |
申请公布号 |
US2013050226(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201113221677 |
申请日期 |
2011.08.30 |
申请人 |
SHENOY RAVINDRA VAMAN;BURNS DAVID WILLIAM;PETERSEN KURT EDWARD;QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
SHENOY RAVINDRA VAMAN;BURNS DAVID WILLIAM;PETERSEN KURT EDWARD |
分类号 |
G06T1/00;B05D3/10;B05D3/12;B05D5/12;B32B37/14;B32B38/10;C23F1/00;H05K1/00;H05K7/00 |
主分类号 |
G06T1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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