EXPOSURE APPARATUS AND METHOD FOR THE PATTERNED EXPOSURE OF A LIGHT-SENSITIVE LAYER

摘要

The invention relates to an exposure apparatus (5), comprising: a substrate (6) with a light-sensitive layer (1), a generating device (7) for generating a plurality of exposure rays (3) having an exposure wavelength (?B), wherein each exposure ray (3) is assigned to a partial region of the light-sensitive layer (1) and the generating device (7) is designed to generate exposure rays (3) having a maximum intensity that lies above an intensity threshold value for converting the light-sensitive layer (1) from a second state into a first state, a movement device (13) for moving the exposure rays (3) relative to the respectively assigned partial region, and an excitation light source (31) for generating excitation radiation (32) having an excitation wavelength (??) for converting the light-sensitive layer (1) from the first state into the second state. The invention also relates to an associated exposure method.