发明名称 |
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement including a first lambda/2 plate and at least one additional lambda/2 plate. |
申请公布号 |
US2013050673(A1) |
申请公布日期 |
2013.02.28 |
申请号 |
US201213661381 |
申请日期 |
2012.10.26 |
申请人 |
CARL ZEISS SMT GMBH;CARL ZEISS SMT GMBH |
发明人 |
SAENGER INGO;DITTMANN OLAF;ZIMMERMANN JOERG |
分类号 |
G03B27/54;G02B5/30 |
主分类号 |
G03B27/54 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|