发明名称 PROTECTION OF EDGE EXCLUSION MASK SHIELDING
摘要 <p>A masking arrangement (300) for masking a substrate during layer deposition is described. The masking arrangement includes a mask structure (340) forming an aperture for exposing the substrate during a layer deposition, and a protection shield (150), which is provided adjacent to the masking structure, wherein the protection shield protects one or more portions of the masking arrangement from being coated during layer deposition, and wherein an interface (360) is formed between the protection shield and the masking structure, and wherein the mask structure comprises a roof portion (342) extending over the interface, and wherein the roof portion forms a gap (344) with a portion of the protection shield.</p>
申请公布号 WO2013026492(A1) 申请公布日期 2013.02.28
申请号 WO2011EP64669 申请日期 2011.08.25
申请人 APPLIED MATERIALS, INC.;ZENGEL, CLAUS;LINDENBERG, RALPH;WURSTER, HARALD;HANSEN, HAUKE 发明人 ZENGEL, CLAUS;LINDENBERG, RALPH;WURSTER, HARALD;HANSEN, HAUKE
分类号 C23C14/04;C23C16/04 主分类号 C23C14/04
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