摘要 |
<p>A masking arrangement (300) for masking a substrate during layer deposition is described. The masking arrangement includes a mask structure (340) forming an aperture for exposing the substrate during a layer deposition, and a protection shield (150), which is provided adjacent to the masking structure, wherein the protection shield protects one or more portions of the masking arrangement from being coated during layer deposition, and wherein an interface (360) is formed between the protection shield and the masking structure, and wherein the mask structure comprises a roof portion (342) extending over the interface, and wherein the roof portion forms a gap (344) with a portion of the protection shield.</p> |
申请人 |
APPLIED MATERIALS, INC.;ZENGEL, CLAUS;LINDENBERG, RALPH;WURSTER, HARALD;HANSEN, HAUKE |
发明人 |
ZENGEL, CLAUS;LINDENBERG, RALPH;WURSTER, HARALD;HANSEN, HAUKE |