| 摘要 |
<p>PURPOSE: A passivation layer process method and a device are provided to rapidly switch a required pattern corresponding to changes of a design, thereby reducing production costs. CONSTITUTION: A coating device coats an etching agent on a surface of a passivation layer. An orienting system(20) coats the etching agent on the surface of the passivation layer. The orienting system controls a movement speed and a movement direction of the coating device. The coating device includes a syringe(301) having the etching agent, a pressing device(303) pressing the etching agent, and a control unit(305) controlling a size of pressure and a work state of the pressing device. [Reference numerals] (20) Precision orienting system; (303) High pressing device; (305) Control unit; (306) Storage box; (AA,BB,304) Pressure switch; (CC,301,DD) Syringe</p> |
