RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which enables production of a resist pattern having a superior mask error factor and reduced number of defects.

SOLUTION: A resist composition contains: a resin having a structural unit represented by the formula (aa) and at least one of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and an acid generator.

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