| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables production of a resist pattern having reduced defects and superior line edge roughness (LER). <P>SOLUTION: A resist composition contains a resin having a structural unit represented by the formula (aa), an acid generator and a cyclic ketone solvent, where R<SP POS="POST">aa1</SP>represents a hydrogen atom or a methyl group; R<SP POS="POST">aa2</SP>represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and A<SP POS="POST">aa1</SP>represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-1). <P>COPYRIGHT: (C)2013,JPO&INPIT |
