SULFONIUM COMPOUND, PHOTOACID GENERATOR, AND RESIST COMPOSITION

摘要

OF THE DISCLOSUREA sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided:[Chemical Formula 1] F29R4HX-C -S-0 - + S—R6I I0 R50wherein X represents an electron donor group; RI and R2 each independently represent an alkyl group or the like; R4 to R6 each independently represent an alkyl group, or the like; R3 represents a cyclic alkenediyl group or the like; and -A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.Figure 1