| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition having superior focus margin (DOF) and reduced defects. <P>SOLUTION: A resist composition contains a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). <P>COPYRIGHT: (C)2013,JPO&INPIT |
