| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables production of a resist pattern having a superior mask error factor and reduced number of defects. <P>SOLUTION: A resist composition contains a resin having a structural unit represented by the formula (I), a resin which is insoluble or poorly soluble in alkali aqueous solution, becomes soluble in an alkali aqueous solution by the action of acid, does not include the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II). <P>COPYRIGHT: (C)2013,JPO&INPIT |
