发明名称 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF THE SAME, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To relax heat stress caused by a heat treatment in bonding of an element and a substrate, at centers of bumps. <P>SOLUTION: A semiconductor device comprises: an element 10; a substrate 20; and bumps 30 each including a first conductors 32, a second conductor 34 formed on the first conductor, a third conductor 36 formed on the second conductor, and a fourth conductor 38 formed on the third conductor, for electrically connecting the element and the substrate, in which one of the first conductor and the fourth conductor is bonded to the element and the other of the first conductor and the fourth conductor is bonded to the substrate. Each of the first conductor and the third conductor has a melting point higher than each of the second conductor and the fourth conductor. The fourth conductor has a melting point higher than the second conductor. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013042018(A) 申请公布日期 2013.02.28
申请号 JP20110178678 申请日期 2011.08.18
申请人 FUJITSU LTD 发明人 TAKENOCHI MASATOSHI
分类号 H01L21/60 主分类号 H01L21/60
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