| 摘要 |
Disclosed is a composition for a photocurable imprint, which has good pattern transferring properties and good mold (pattern formation surface) release properties regardless of the type of a polymerizable monomer contained therein, and therefore can form a pattern having excellent shape with high repeatability; and a method for forming a pattern on a substrate by optical imprinting, which uses the composition. The composition for a photocurable imprint comprises (A) a polymerizable monomer having a (meth)acrylic group, (B) a photopolymerization initiator, and (C) a hyperbranch polymer produced by polymerizing a polymerizable monomer having a (meth)acrylic group. Preferably, the composition contains 0.1-10 parts by mass of the photopolymerization initiator (B) and 0.1-10 parts by mass of the hyperbranche polymer (C) relative to 100 parts by mass of the polymerizable monomer (A). |
