| 摘要 |
<p>PURPOSE: An apparatus and a method for heating a substrate are provided to prevent fume from being resupplied to the substrate by arranging the substrate in the vertical direction. CONSTITUTION: A process chamber(100) has a space. A heating plate(200) is positioned in the process chamber. A heater is placed in the heating plate. A substrate chucking part(300) is separated from a heating surface. The substrate chucking part chucks the substrate to face the heating surface.</p> |
