发明名称 Removing aluminum nitride sections
摘要 Approaches for substantially removing bulk aluminum nitride (140) from one or more layers (150) epitaxially grown on the bulk aluminum nitride (AIN) are discussed. The bulk AIN (140) is exposed to an etchant during an etching process. During the etching process, the thickness of the bulk AIN can be measured and used to control etching.
申请公布号 EP2562800(A2) 申请公布日期 2013.02.27
申请号 EP20120181406 申请日期 2012.08.22
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 KRUSOR, BRENT S.;CHUA, CHRISTOPHER L;WUNDERER, THOMAS;JOHNSON, NOBLE M.;CHENG, BOWEN
分类号 H01L21/66;H01L21/67;H01L33/00 主分类号 H01L21/66
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