Method of depositing metal nanoparticles by physical deposition in vapour phase

摘要

#CMT# #/CMT# The process for the deposition of metallic nanoparticles e.g. silver nanoparticles in an anti-bacterial substrate by physical vapor deposition, comprises performing a magnetron cathodic pulverization of a target metal at a surface of a substrate in the presence of a neutral gas. The cathodic pulverization is carried out in an enclosure for 20 seconds at ambient temperature with a discharge power density of 1 W/cm 2>on the target metal. The enclosure is maintained at a pressure of 30-40 Pa. The metallic nanoparticles are deposited in a time period of 2-20 seconds. #CMT# : #/CMT# The process for the deposition of metallic nanoparticles e.g. silver nanoparticles in an anti-bacterial substrate by physical vapor deposition, comprises performing a magnetron cathodic pulverization of a target metal at a surface of a substrate in the presence of a neutral gas. The cathodic pulverization is carried out in an enclosure for 20 seconds at ambient temperature with a discharge power density of 1 W/cm 2>on the target metal. The enclosure is maintained at a pressure of 30-40 Pa. The metallic nanoparticles are deposited in a time period of 2-20 seconds. The distance between the target and the substrate is 40-60 mm. The substrate crosses the enclosure at a scrolling speed of 2-20 seconds. An independent claim is included for a substrate. #CMT#USE : #/CMT# The process is useful for the deposition of metallic nanoparticles such as silver- and semiconductor nanoparticles in an anti-bacterial substrate by physical vapor deposition, where the substrate is glass, silicon, steel, ceramics such as alumina, cerine and zirconia, fabric, zeolite and polymer and useful as an electrode material for a fuel cell and a photovoltaic material (all claimed). #CMT#ADVANTAGE : #/CMT# The process is capable of easily and economically depositing the metallic nanoparticles in the substrate surface with improved quality thus providing high environmental protection to the fuel cell, and allows a good control of the formation and distribution of nanoparticles on the substrate. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The figure shows a scanning electron microscope photograph of a silicon substrate. #CMT#INORGANIC CHEMISTRY : #/CMT# Preferred Components: The neutral gas is argon. The target metal is platinum, silver, gold, nickel, palladium, copper, rhodium, iridium, ruthenium, chromium and/or molybdenum.