发明名称 APPARATUS FOR FORMING CIGS LAYER
摘要 <p>PURPOSE: A CIGS layer forming apparatus is provided to improve productivity by uniformly transmitting atmospheric gas to the entire surface of one substrate. CONSTITUTION: A wall(110) is vertically installed and provides a plurality of chambers. The chamber processes a plurality of substrates which are erected with a constant interval. A door(121) vertically moves on the lower side of the wall and opens and closes the chamber. A boat(140) is mounted and supported on the door and supports several substrates. A diffusion member(160) is located on the lower side of the boat and vertically moves with the door and guides the atmospheric gas to be concentrated on the boat and be diffused.</p>
申请公布号 KR20130020461(A) 申请公布日期 2013.02.27
申请号 KR20110083112 申请日期 2011.08.19
申请人 TERASEMICON CORPORATION 发明人 LEE, KYUNG HO
分类号 H01L31/18;H01L31/0445 主分类号 H01L31/18
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