发明名称 REMOVAL OF SILICON FROM SOLUTION
摘要 FIELD: chemistry.SUBSTANCE: invention can be used in chemical industry. In order to remove silicon compounds from water NaCl brines, first, pH lower than 3 is created with hydrochloric acid in weak brine. Iron (III) chloride or other trivalent iron compounds are added to acidified brine. Prepared brine is continuously introduced into mixing dissolution reactor, in which in addition to brine undissolved salt is placed. Fresh salt is added into reactor periodically in portions. Formed concentrated brine is introduced into mixing buffer tank. PH from 5 to 8 is supported in buffer tank. From buffer tank flow of concentrated brine is continuously withdrawn and filtered, filtrate is discharged. Device for removal of silicon compounds from solution contains reactor of salt dissolution, mixing device in it, charging device for supply of salt into reactor, feeding point for supply of weak brine into reactor, feeding points for supply of hydrochloric acid and iron (III) chloride into line of weak brine supply, buffer tank for concentrated brine, mixing device in buffer tank, hydrodynamic connection between dissolution reactor and buffer tank and discharging device for filter cake, discharge channel and transport mechanism for delivery of concentrated brine from buffer tank into filter.EFFECT: invention makes it possible to increase rate and simplify process of purification of brine, intended for electrolysis.15 cl, 2 dwg
申请公布号 RU2476379(C2) 申请公布日期 2013.02.27
申请号 RU20100131611 申请日期 2008.12.23
申请人 UDE GMBKH 发明人 POL' VERNER;SHTEGEMANN KRISTOF;SHTAJNMETTS TOMAS;PEL'KONEN ZAMI
分类号 C01D3/16;C25B15/08 主分类号 C01D3/16
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