Method and apparatus for controlling a plurality of actuators of a projection exposure apparatus for microlithography,申请号EP20080159027-传众专利搜索

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发明名称	Method and apparatus for controlling a plurality of actuators of a projection exposure apparatus for microlithography
摘要
申请公布号	EP2009501(B1)	申请公布日期	2013.02.27
申请号	EP20080159027	申请日期	2008.06.25
申请人	CARL ZEISS SMT GMBH	发明人	ROHE, THOMAS;FISCHER, JUERGEN;BACH, FLORIAN
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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