发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE
摘要 <p>PURPOSE: A positive type photosensitive resin composition is provided to have high sensitivity, high tolerance to a separation liquid and NMP, and to have excellent transparent electrode film and metal. CONSTITUTION: A positive type photosensitive resin composition: contains a structure unit indicated in chemical formula a1-1 which has an acetal or ketal residue; and a copolymer with a pre-crosslinkable group. In chemical formula a1-1, R1 is a hydrogen atom or methyl group, R2 is a C1-6 alkyl group, R3 is a C1-6 alkyl group or C4-7 cycloalkyl group, and R2 and R3 can form a ring by being connected to each other.</p>
申请公布号 KR20130020631(A) 申请公布日期 2013.02.27
申请号 KR20120090085 申请日期 2012.08.17
申请人 FUJIFILM CORPORATION 发明人 SHIMOYAMA TETSUYA;YAMAZAKI KENTA;KAWASHIMA TAKASHI;HIKITA MASANORI
分类号 G03F7/039;G02F1/13;G03F7/11;H01L51/50 主分类号 G03F7/039
代理机构 代理人
主权项
地址