发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE |
摘要 |
<p>PURPOSE: A positive type photosensitive resin composition is provided to have high sensitivity, high tolerance to a separation liquid and NMP, and to have excellent transparent electrode film and metal. CONSTITUTION: A positive type photosensitive resin composition: contains a structure unit indicated in chemical formula a1-1 which has an acetal or ketal residue; and a copolymer with a pre-crosslinkable group. In chemical formula a1-1, R1 is a hydrogen atom or methyl group, R2 is a C1-6 alkyl group, R3 is a C1-6 alkyl group or C4-7 cycloalkyl group, and R2 and R3 can form a ring by being connected to each other.</p> |
申请公布号 |
KR20130020631(A) |
申请公布日期 |
2013.02.27 |
申请号 |
KR20120090085 |
申请日期 |
2012.08.17 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SHIMOYAMA TETSUYA;YAMAZAKI KENTA;KAWASHIMA TAKASHI;HIKITA MASANORI |
分类号 |
G03F7/039;G02F1/13;G03F7/11;H01L51/50 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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