APPARATUS FOR TREATING A SUBSTRATE

摘要

PURPOSE: A substrate processing device is provided to uniformly process a substrate in each chamber by uniformizing a gas flow from a plurality of chambers. CONSTITUTION: A first chamber(110) includes a first space to process a substrate. A second chamber(120) is located on the upper side of the first chamber and includes a second space to process the substrate. An exhaust unit(200) is connected to the first chamber and the second chamber. An exhaust unit exhausts gas from the first space and the second space and includes a body and an exhaust pipe(230,232). The exhaust pipe is located in the body and includes an exhaust hole(235) to absorb the gas from the body.