| 摘要 |
PURPOSE: A CIGS layer forming apparatus is provided to improve productivity by horizontally installing a heater on the lower side of a chamber. CONSTITUTION: A wall(110) provides a chamber(110a) to load and process a plurality of substrates which are vertically erected with a constant interval. A door is installed on the lower side of the wall and opens and closes the chamber. A plurality of first heaters(135) are installed and vertically moves with the door. A plurality of second heaters(141) are installed on the wall and are vertical to the chamber. The plurality of first heaters and second heaters heat atmospheric gas from the first heaters and the second heaters. |
