| 摘要 |
<p>PURPOSE: A support table for a lithographic apparatus is provided to prevent the influence on image formation on a substrate due to an additional heat loading. CONSTITUTION: A support table for a lithographic apparatus comprises a support table for lithography apparatus(WT), a support part(22), and a conditioning system(21). A conditioning system supplies heat energy to the support part and/or remove heat energy from the support part. When the substrate is supported by a support plate, the substrate is thermally coupled by the support plate and supplies heat energy to the support part. When heat energy is removed from the support part, energy is transferred from the support part to the substrate or from the substrate to the support part. As the result of the conditioning system, heat transfer from the substrate or to the substrate in a second region(27) which is the center of the substrate is higher than a first region(26) near the edge of the substrate.</p> |
