| 摘要 |
PURPOSE: A substrate processing apparatus is provided to independently control gas quantity by connecting a center part and peripheral parts to gas lines. CONSTITUTION: A support member(200) includes a heater and receives a substrate in a processing chamber(102). A gas distribution plate(106) is located on the upper side of the support member. A gas supply unit supplies gas to the processing chamber. A center part and peripheral parts are connected to the gas lines.
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