APPARATUS FOR TREATING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to prevent the contamination of a substrate by preventing a sidewall of a housing from being spattered with chemical solutions. CONSTITUTION: A spin head rotates and supports a substrate. A housing surrounds the spin head. A spray unit supplies chemical solutions to the substrate. An inner wall(330) of the housing includes a curved part. A concave part(324a) and a protrusion part(324b) are repeatedly formed on the inner wall of the housing.