Multi-beam exposure scanning method and apparatus and printing plate manufacturing method

摘要

A multi-beam exposure scanning method includes: simultaneously emitting a plurality of beams with an interval between scanning lines toward a recording medium; and performing engraving on a surface of the recording medium by performing exposure scanning a plurality of times with a same scanning line, the method further includes: repeatedly performing interlaced exposure using a beam group with an interval between adjacent beams N times (N is an integer equal to 2 or more) larger than the interval between the scanning lines Nxm times (m is an integer equal to 2 or more) on a first area surrounding a flat-shaped target area to be left on the surface, to expose each of the scanning lines m times; and performing non-interlaced exposure using a beam group with an interval between adjacent beams equal to the interval between the scanning lines on a second area, which is outside the first area.