发明名称 Thermal interface material and semiconductor component including the thermal interface material
摘要 A thermal interface material for use in manufacturing a semiconductor component and a method for manufacturing the semiconductor component. The thermal interface material includes a metallic element in combination with either antimony or tin. Suitable metallic elements include gallium or indium. The concentration of antimony or tin is about 2 percent or less by weight of the thermal interface material. A semiconductor chip is mounted to a support substrate and the thermal interface material is disposed on the semiconductor chip. A lid or a heatsink is coupled to the semiconductor chip via the thermal interface material.
申请公布号 US8384210(B1) 申请公布日期 2013.02.26
申请号 US20050147598 申请日期 2005.06.07
申请人 ADVANCED MICRO DEVICES, INC.;BLISH, II RICHARD C.;HAYWARD JAMES L. 发明人 BLISH, II RICHARD C.;HAYWARD JAMES L.
分类号 H01L23/34 主分类号 H01L23/34
代理机构 代理人
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