Thermal interface material and semiconductor component including the thermal interface material
摘要
A thermal interface material for use in manufacturing a semiconductor component and a method for manufacturing the semiconductor component. The thermal interface material includes a metallic element in combination with either antimony or tin. Suitable metallic elements include gallium or indium. The concentration of antimony or tin is about 2 percent or less by weight of the thermal interface material. A semiconductor chip is mounted to a support substrate and the thermal interface material is disposed on the semiconductor chip. A lid or a heatsink is coupled to the semiconductor chip via the thermal interface material.
申请公布号
US8384210(B1)
申请公布日期
2013.02.26
申请号
US20050147598
申请日期
2005.06.07
申请人
ADVANCED MICRO DEVICES, INC.;BLISH, II RICHARD C.;HAYWARD JAMES L.