发明名称 METODO ED IMPIANTO DI CONTROLLO PER LA STAMPA DI UNO SCHEMA MULTISTRATO
摘要 The present invention provides a control method and apparatus for printing a multilayer pattern on a substrate. In one embodiment, a method for printing a multilayer pattern includes a first printing operation comprising depositing a first patterned layer on a region of a surface of the substrate, a second printing operation comprising depositing a second patterned layer over the region of the surface or first patterned layer, and verifying the precision of the alignment of the second patterned layer relative to the first patterned layer. Verifying comprises acquiring a first optical image of the first patterned layer after the first printing operation, acquiring a second optical image of the second patterned layer after the second printing operation, and determining the position of the second patterned layer by performing an image subtraction process to form a first subtracted optical image and comparing the subtracted optical image with the first image.
申请公布号 ITUD20110135(A1) 申请公布日期 2013.02.26
申请号 IT2011UD00135 申请日期 2011.08.25
申请人 APPLIED MATERIALS ITALIA S.R.L. 发明人 BOSCOLO MARCHI ENRICO;VERCESI TOMMASO
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