| 摘要 |
The invention provides an alkali-developable resin composition giving an alkali-developable photosensitive resin composition which is excellent in sensitivity, resolution, transparency, an adhesion property, alkali resistance and so on, and which forms a fine pattern with excellent accuracy. The alkali-developable resin composition contains a reaction product obtained by esterifying an epoxy addition product having a structure resulting from addition of an unsaturated monobasic acid (B) and a cyclic terpene skeleton containing phenolic compound (C-1) obtained by adding phenol or an alkylphenol compound to a cyclic terpene compound and/or an aliphatic alkylphenol compound (C-2) to a polyfunctional epoxy resin (A) with a polybasic acid anhydride (D), and has a structure resulting from addition conducted so as to have at least one ethylenically unsaturated group in the molecule, wherein the esterification is conducted with a ratio of 0.2-0.8 acid anhydride structure of the polybasic acidanhydride (D) to one hydroxyl group of the epoxy addition product. |
