| 摘要 |
In sophisticated semiconductor devices, the metal-containing layer stack at the back side of the substrate may be provided so as to obtain superior adhesion to the semiconductor material in order to reduce the probability of creating leakage paths in a bump structure upon separating the substrate into individual semiconductor chips. For this purpose, in some illustrative embodiments, an adhesion layer including a metal and at least one non-metal species may be used, such as titanium oxide, in combination with further metal-containing materials, such as titanium, vanadium and gold.
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