发明名称 Transistor using derivative polymethyl-methacrylate thin film as gate insulator and passivation layer, and fabrication method thereof
摘要 Disclosed are a transistor including a gate insulation layer and an organic passivation layer of a polymer thin film, and a fabrication method thereof. The transistor comprises a substrate, a gate electrode formed on the substrate, a gate insulation layer including a polymethacrylic acid thin film, formed on the gate electrode and the substrate, a channel layer formed on the gate insulation layer, source electrode and drain electrode formed on the channel layer so as to expose at least a part of the channel layer, and an organic passivation layer including a polymethacrylic acid thin film, formed on the source electrode, drain electrode and the partially exposed channel layer. The method for fabricating a transistor comprises steps of forming a gate electrode on a substrate, forming a gate insulation layer of a polymethacrylic acid thin film on the gate electrode and the substrate, forming a channel layer on the gate insulation layer, forming source electrode and drain electrode on the channel layer so as to expose at least a part of the channel layer, and forming an organic passivation layer of a polymethacrylic acid thin film on the source electrode, drain electrode and the partially exposed channel layer.
申请公布号 US8384082(B2) 申请公布日期 2013.02.26
申请号 US20100771180 申请日期 2010.04.30
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY;KIM IL DOO;KIM DONG HUN;CHOI SEUNG HUN 发明人 KIM IL DOO;KIM DONG HUN;CHOI SEUNG HUN
分类号 H01L29/786;H01L21/44 主分类号 H01L29/786
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