发明名称 |
Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
摘要 |
An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
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申请公布号 |
US8384880(B2) |
申请公布日期 |
2013.02.26 |
申请号 |
US20080232064 |
申请日期 |
2008.09.10 |
申请人 |
NIKON CORPORATION;OWA SOICHI;MAGOME NOBUTAKA;HIRUKAWA SHIGERU;KUDO YOSHIHIKO;INOUE JIRO;KOHNO HIROTAKA;NEI MASAHIRO;IMAI MOTOKATSU;NAGASAKA HIROYUKI;SHIRAISHI KENICHI;NISHII YASUFUMI;TAKAIWA HIROAKI |
发明人 |
OWA SOICHI;MAGOME NOBUTAKA;HIRUKAWA SHIGERU;KUDO YOSHIHIKO;INOUE JIRO;KOHNO HIROTAKA;NEI MASAHIRO;IMAI MOTOKATSU;NAGASAKA HIROYUKI;SHIRAISHI KENICHI;NISHII YASUFUMI;TAKAIWA HIROAKI |
分类号 |
G03B27/58;G03B27/32;G03B27/42;G03B27/52;G03F7/20 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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