| 摘要 |
PURPOSE: A lithography model for 3D topographic wafers is provided to reduce operation costs by simulating an image in a resist layer of a substrate. CONSTITUTION: A substrate has features(250) in or under a resist layer. A substrate specific scattering function is determined using one or more scattering functions. The scattering functions are based on the properties of the features. The substrate specific scattering function specializes the scattering of incident radiation in the resist layer. |
